Random layers of overlapping argyle-like lines bring a subtle sense of three-dimensionality and movement to this large-scale pattern. Trace is designed with a no match horizontal repeat resulting in ease of installation, minimal waste, and a completely randomized patterning effect.
Xorel Trace
$61.00
/yd.
6039S
A $3.00 per yard cut charge applies to orders under 50 yardsMinimum order - 5 yards
Select Use: Upholstery
Upholstery
Extreme performance textile for seating/bench/headboard applications. Proprietary X Protect Sit™ technology prevents stains and moisture from passing through textile
Wallcoverings
For direct application to the wall. Can endure extreme abuse and be cleaned aggressively with included proprietary X Protect WallTM backing. Exceeds Type II criteria.
Upholstered Walls/Panels
Textile is wrapped around substrate (i.e. acoustical, tackable)
Upholstery Specifications
Backing:
X-Protect™ Sit
X-Protect Sit: A proprietary technology which prevents stains and moisture from passing through textile to the seat cushion.
Backing (as stocked):
X-Protect™ Sit
X-Protect Sit: A proprietary technology which prevents stains and moisture from passing through textile to the seat cushion.
Backing Note(s):X-Protect Sit: A proprietary technology which prevents stains and moisture from passing through textile to the seat cushion.
Finish/es (as stocked):
Finish-Free
Durability:No wear 1 million double rubsResults above 100,000 double rubs have not been shown to be a reliable indicator of increased fabric lifespan
Width:54" (137 cm)
Weight per Linear Yard:
14 oz
Contents:100% IFR Xorel®
Cleaning Code:WS & BC - Water/Solvent & Bleach Cleanable
Flammability:California Technical Bulletin 117-2013IMO 2010 FTP Part 8 for Upholstery as Stocked
IMO Certification Type:
IMOIMO 2010 FTP Part 8 for Upholstery as Stocked
Random layers of overlapping argyle-like lines bring a subtle sense of three-dimensionality and movement to this large-scale pattern. Trace is designed with a no match horizontal repeat resulting in ease of installation, minimal waste, and a completely randomized patterning effect.